{"id":657,"date":"2023-11-29T07:32:30","date_gmt":"2023-11-29T07:32:30","guid":{"rendered":"https:\/\/test.metrosemi.com\/?page_id=657"},"modified":"2023-12-14T14:18:46","modified_gmt":"2023-12-14T14:18:46","slug":"ls-series","status":"publish","type":"page","link":"https:\/\/test.metrosemi.com\/?page_id=657","title":{"rendered":"LS Series"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-page\" data-elementor-id=\"657\" class=\"elementor elementor-657\">\n\t\t\t\t<div class=\"elementor-element elementor-element-37575a0 e-flex e-con-boxed e-con e-parent\" data-id=\"37575a0\" data-element_type=\"container\" data-e-type=\"container\" data-settings=\"{&quot;background_background&quot;:&quot;classic&quot;}\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-32935fb elementor-widget elementor-widget-text-editor\" data-id=\"32935fb\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<h3><strong>Wafer Surface Inspection System LS Series<\/strong><\/h3><h5>The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control.<\/h5>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-67692e6 e-flex e-con-boxed e-con e-parent\" data-id=\"67692e6\" data-element_type=\"container\" data-e-type=\"container\" data-settings=\"{&quot;background_background&quot;:&quot;classic&quot;}\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div class=\"elementor-element elementor-element-99eebb3 e-con-full e-flex e-con e-child\" data-id=\"99eebb3\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-bb3d129 elementor-widget elementor-widget-text-editor\" data-id=\"bb3d129\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<h4><strong>Applications &amp; General Specification<\/strong><\/h4><div class=\"feature-list\"><ul><li><b>For device manufacturer:<\/b>\u00a0incoming inspection and process tool monitoring use<\/li><li><b>For tool and material manufacturer:<\/b>process and material evaluation use<\/li><li><b>For wafer supplier:<\/b>\u00a0outgoing inspection with wafer edge handling use<\/li><li><b>Optics:<\/b>New optics provides high sensitivity inspection<\/li><li><b>Wafer Stage:<\/b>High speed stage provides high throughput inspection<\/li><li><b>Defect detection:<\/b>High accuracy detection discrimination<\/li><li><b>Wafer Size:<\/b>\u03c6300mm (V notch type by SEMI standard)<\/li><\/ul><\/div>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-06d57ff e-con-full e-flex e-con e-child\" data-id=\"06d57ff\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-c67eb0b elementor-widget elementor-widget-image\" data-id=\"c67eb0b\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"300\" height=\"296\" src=\"https:\/\/test.metrosemi.com\/wp-content\/uploads\/2023\/12\/07-1-300x296.png\" class=\"attachment-medium size-medium wp-image-942\" alt=\"\" srcset=\"https:\/\/test.metrosemi.com\/wp-content\/uploads\/2023\/12\/07-1-300x296.png 300w, https:\/\/test.metrosemi.com\/wp-content\/uploads\/2023\/12\/07-1.png 343w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>Wafer Surface Inspection System LS Series The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"no-sidebar","site-content-layout":"page-builder","ast-site-content-layout":"full-width-container","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"disabled","ast-breadcrumbs-content":"","ast-featured-img":"disabled","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"footnotes":""},"class_list":["post-657","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/pages\/657","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=657"}],"version-history":[{"count":7,"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/pages\/657\/revisions"}],"predecessor-version":[{"id":948,"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=\/wp\/v2\/pages\/657\/revisions\/948"}],"wp:attachment":[{"href":"https:\/\/test.metrosemi.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=657"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}